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1. www.alan.ece.gatech.edu › ECE6450 › LecturesLecture 11 Etching Techniques Reading: Chapter 11 - gatech.edu

   www.alan.ece.gatech.edu › ECE6450 › Lectures

   Etching can be characterized by how much of the process is: Chemical: Using the chemistry of the etch to remove material into a solution (liquid or gaseous solution) Sputtering: In plasma systems, Ions can be accelerated fast enough so as to “Ram” into the surface, “knocking out”

2. www.kth.se › social › uploadLecture 7 Etching - KTH

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   Concept Test 7.1 7.1: A plasma etch process can be described with the following terms: Etch Rate – Selectivity -Anisotropy – Uniformity A plasma etch tool has the following process parameters: Pressure, Temperature, Gas composition, Gas flow, Substrate bias, RF power. Which of the following statements are true: A. Pressure affects ...

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3. www.cityu.edu.hk › phy › appkchuCHAPTER 6: Etching - City University of Hong Kong

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   In wafer fabrication, chemical etching is used for lapping and polishing to give an optically flat, damage-free surface. Prior to thermal oxidation or epitaxial growth, wafers are chemically cleaned and scrubbed to remove contamination that results from handling and storing.

4. www.chem.tamu.edu › class › fypSample Exam Questions - Texas A&M University

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   general chemistry Choose your chapter: Fundamentals of Chemistry | Chemical Formulas & Composition Stoichiometry | Chemical Equations & Rxn Stoichiometry | Types of Chemical Reactions |

5. www.scribd.com › mid-year-exam-chemistry-form-4Mid Year Exam Chemistry Form 4 | PDF | Magnesium | Chemical ...

   www.scribd.com › mid-year-exam-chemistry-form-4

   mid year exam chemistry form 4 - Free download as Word Doc (.doc), PDF File (.pdf), Text File (.txt) or read online for free. This document contains a multi-part chemistry exam with questions about: 1) Interpreting a graph of temperature over time for a substance being heated to boiling.

6. www.studocu.com › applied-chemistry › 3248646Applied Chemistry - ETCH 113 - IPU - Studocu

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   Studying Applied Chemistry ETCH 113 at Guru Gobind Singh Indraprastha University? On Studocu you will find 31 lecture notes, practice materials, summaries, mandatory.

7. People also ask

   Is dry etching chemical or selective?

   • Figure by MIT OCW. Now we consider dry etching (which has largely replaced wet) based on highly anisotropic sputtering process and may include reactive ions, so can also be chemical and selective. Brief history of two types of etch processes... 1. Need better definition of small features Figure by MIT OCW. Figure by MIT OCW. 2.

   Dry Etching - MIT OpenCourseWare

   ocw.mit.edu/courses/6-152j-micro-nano-processing-technology-fall-2005/59b9f31d836355a3380aa156925508bc_lecture17.pdf

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   What is wet chemical etching?

   • Wet chemical etching is employed in various processing steps. In wafer fabrication, chemical etching is used for lapping and polishing to give an optically flat, damage-free surface. Prior to thermal oxidation or epitaxial growth, wafers are chemically cleaned and scrubbed to remove contamination that results from handling and storing.

   CHAPTER 6: Etching - City University of Hong Kong

   www.cityu.edu.hk/phy/appkchu/AP6120/6.PDF

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   Which chemical process results in isotropic etching?

   • As shown in Figure 6.1, wet chemical processes result in isotropic etching where both the vertical and lateral etch rates are comparable, whereas dry etching processes like sputter etching, plasma etching, ion beam etching, and reactive ion etching are anisotropic.

   CHAPTER 6: Etching - City University of Hong Kong

   www.cityu.edu.hk/phy/appkchu/AP6120/6.PDF

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   What is chemical etching used for?

   • For many discrete devices and integrated circuits of relatively large dimensions (> 3 μ), chemical etching is used to delineate patterns and to open windows in insulating materials. solvent or by converting the material into a soluble compound that subsequently dissolves in the etching medium.

   CHAPTER 6: Etching - City University of Hong Kong

   www.cityu.edu.hk/phy/appkchu/AP6120/6.PDF

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   What is dry etching?

   • Dry etching is synonymous with plasma-assisted etching or reactive plasma etching, which denotes several techniques that employ plasma in the form of a low-pressure discharge. Figure 6.3: Comparison of wet chemical etching and dry etching for pattern transfer. plasma is a fully or partially ionized gas composed of ions, electrons, and neutrals.

   CHAPTER 6: Etching - City University of Hong Kong

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   Do chemical and physical components of plasma etching act independently?

   • • It has been observed that chemical and physical components of plasma etching do not always act independently - both in terms of net etch rate and in resulting etch profile. 2 gas (not plasma) and Ar+ ions are introduced to silicon surface. Only when both are present does appreciable etching occur

   Lecture 7 Etching - KTH

   www.kth.se/social/upload/510f795cf276544e1ddda13f/Lecture 7 Etching.pdf

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8. ocw.mit.edu › courses › 6-152j-micro-nano-processingDry Etching - MIT OpenCourseWare

   ocw.mit.edu › courses › 6-152j-micro-nano-processing

   Now we consider dry etching (which has largely replaced wet) based on highly anisotropic sputtering process and may include reactive ions, so can also be chemical and selective. Brief history of two types of etch processes... 1. Need better definition of small features. Figure by MIT OCW. 2.